New EDX-GP Energy Dispersive X-ray Fluorescence Spectrometer for RoHS/ELV Screening

Analytical instrumentation

New EDX-GP Energy Dispersive X-ray Fluorescence Spectrometer for RoHS/ELV Screening

01 Aug, 2009

Published over 16 years ago. See the latest and most current information on Analytical instrumentation.

The EDX-GP, the newest model in Shimadzu Scientific Instrument’s (USA) EDX series, offers fast, high-sensitivity measurements optimised for RoHS/ELV hazardous element screening with easy, automatic operation for first-time users.

The EDX-GP uses the same proprietary semiconductor detector as Shimadzu’s EDX-720 to deliver high sensitivity, high resolution and precision measurement of all light to heavy elements. The optical system, special filters and high count-rate circuit deliver ideal performance for RoHS/ELV screening. Optimal filters are automatically selected, and high-speed mode conditions are now installed by default to allow batch measurements of RoHS/ELV hazardous elements using a single filter. Users can complete a single-filter, high-speed analysis in 30 seconds, or a high-sensitivity analysis with a special filter in 300 seconds.   With the EDX-GP, operations that previously relied on a user’s judgment are now automated, including instrument start-up and calibration, and the selection of analytical conditions. The software also features a measurement time reduction function for high concentrations of hazardous elements and for samples containing no hazardous elements. This eliminates wasted measurements and achieves more efficient analysis.   In contrast to its compact size, the EDX-GP has a large sample chamber to accommodate as-is measurements of any sample shape or size. Users can load samples quickly and easily with a semiautomatic chamber door for high throughput with less workload.   Other standard functions include pre-measurement instrument check to determine if calibration is necessary; automatic material evaluation to pre-measure sample materials and select analytical conditions; shape correction to eliminate the effect of shape and thickness on results; and thin-film analysis for single- and multi-layer samples.

PIN 27.2 Apr/May 2026

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