Unleashing the analytical power of ICP using Axetris MFCs

Plasma gas control precision and unmatched dynamic range deliver key advantages.

ICP-MS and ICP-OES are powerful analytical techniques where gas flow control plays a critical role in plasma generation and control. Axetris MFCs provide key advantages towards ensuring the highest analytical performance.

Axetris Advantages in ICP applications:

• Extremely high repeatability of typically < 0.15% O.R.
• Unmatched dynamic range (> 1000:1) to provide flexibility across wide flow range of 0-20 slpm
• Ultra low flow control for tight control of plasma and analytical process.

Please find the whole application note on our website.

About Axetris Mass Flow Meters and Controllers

Axetris offers OEM Mass Flow Meters (MFM) and Controllers (MFC) which offer outstanding value to the customer. The proprietary, platinum-based MEMS chip technology guarantees excellent accuracy and repeatability in combination with high speed and an extended dynamic range. The Axetris mass flow technology is used by leading companies in the fields of gas chromatography, leak testing, thermal analytics, mass spectroscopy, thin film deposition, plasma engineering and more. (Image 1*)

ICP combined with a mass spectrometer (Image 2*: Quadrupole MS) can provide an extremely powerful analytical technique in a variety of applications.

Axetris Mass Flow Meters and Controllers can be flexibly integrated into multi-channel manifolds. (Image 3*)