Backpressure Controller for Process Gas Analysis Instrumentation

Analytical instrumentation

Backpressure Controller for Process Gas Analysis Instrumentation

07 Apr, 2009

Published over 17 years ago. See the latest and most current information on Analytical instrumentation.

LFE (Germany) presents its pControl 2F Backpressure Controller for gas analysis instrumentation. In the field of gas analysis an analyser’s response is often dependant upon the sample gas pressure. Pressure dependency can occur through a number of different physical parameters simultaneously and can be difficult to impossible to correct for. The best and most accurate approach is therefore to control the pressure itself. The use of an LFE pControl backpressure controller alleviates the need for complicated correction algorithms.

A further benefit of LFE’s pressure controller is the ability to return the analysed gases back into the process. In this way unnecessary emissions into the environment can be avoided.

The pControl 2F controller typically operates at approximately 0.2 bars above ambient pressure (i.e. 1.2 bar absolute), but can be easily set to other operating pressures. The specially designed control valve of the pControl 2 provides for an extremely constant pressure over an extremely wide range of gas flow (e.g. <10 ln/h up to over 1000 ln/h). This allows for a single LFE pControl to be used in conjunction with a number of gas analysers.

The piezo-resistive pressure transducer is temperature controlled to improve stability. An optional PTFE isolating diaphragm is available to improve corrosion resistance.

PIN 27.2 Apr/May 2026

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